Structure and Properties of Zrtio4 Thin Films Prepared by Reactive Magnetron Co-Sputtering Without Heating

Authors

  • Jindawan Thammapreecha Department of Physics, Faculty of Science, Burapha University, Chonburi, Thailand
  • Alongkot Treetong Nano Characterization Laboratory (NCL) National Nanotechnology Center National Science and Technology Development Agency 111 Thailand Science Park, Phahonyothin Road, Khlong Nueng, Khlong Luang, Pathum Thani, Thailand
  • Bundit Putasaeng National Metal and Materials Technology Center (MTEC) 114 Thailand Science Park (TSP), Phahonyothin Road, Khlong Nueng, Khlong Luang, Pathum Thani, Thailand
  • Nirun Witit-Anun Department of Physics, Faculty of Science, Burapha University, Chonburi 20131,Thailand ; Vacuum Technology and Thin Film Research Laboratory, Department of Physics, Faculty of Science, Burapha University, Chonburi,Thailand
  • Surasing Chaiyakun Department of Physics, Faculty of Science, Burapha University, Chonburi, Thailand ; Vacuum Technology and Thin Film Research Laboratory, Department of Physics, Faculty of Science, Burapha University, Chonburi,Thailand ; Department of Physics, Faculty of Science, King Mongkut’s University of TechnologyThonburi, Bangkok,Thailand
  • Pichet Limsuwan Department of Physics, Faculty of Science, Burapha University, Chonburi, Thailand ; Vacuum Technology and Thin Film Research Laboratory, Department of Physics, Faculty of Science, Burapha University, Chonburi,Thailand; Thailand Center of Excellence in Physics, CHE, Ministry of Education, Bangkok,Thailand

DOI:

https://doi.org/10.18488/journal.63.2017.53.50.54

Abstract

ZrTiO4 thin films were deposited by reactive dc magnetron co-sputtering method without heating. The crystal structure, surface morphology, thickness, optical and dielectric properties of the thin films were investigated. At sputtering currents above 2.0 A without heating ZrTiO4 thin film was crystallization of the orthorhombic phase (111). The values of refractive index were ranged between 2.01 and 2.23 (at 650 nm). The optical packing density values were ranged between 0.85 and 0.96. From this study, it was observed that the refractive index values were strongly dependent on packing densities. The high dielectric constant width decreases from 74.3 to 43.3 when sputtering current increases, which is higher than other research.

Keywords:

Zrtio4, Thin films, Optical properties, Dielectric constant, Co-sputtering

Published

2017-12-19

How to Cite

Thammapreecha, J. . ., Treetong, A. ., Putasaeng, B. . ., Witit-Anun, N. ., Chaiyakun, S. ., & Limsuwan, P. . (2017). Structure and Properties of Zrtio4 Thin Films Prepared by Reactive Magnetron Co-Sputtering Without Heating. International Journal of Natural Sciences Research, 5(3), 50–54. https://doi.org/10.18488/journal.63.2017.53.50.54

Issue

Vol. 5 No. 3 (2017)

Section

Articles